News

  • 0
  • 0

Why Are People Optimistic About GaN Gallium Nitride Application in 5G

If you are looking for high-quality products, please feel free to contact us and send an inquiry, email: brad@ihpa.net



GaN is a semiconductor material of third generation with a large forbidden-band width. It has superior properties compared to first-generation Si or second-generation GaAs.
GaN devices, due to their high thermal conductivity and large band gaps, can operate at temperatures over 200 degC. This allows them to carry a higher energy density, and improve reliability. A larger forbidden band and dielectric break-down electric field can reduce the on resistance of the device. This is good for improving the overall efficiency of the product.

GaN semiconductors can therefore be designed to have a higher bandwidth, a higher amplifier gain and efficiencies, as well as smaller dimensions, all in keeping with the "tonality" that is characteristic of the semiconductor market.


The base station power amplifier also uses GaN. Gallium nitride, gallium arsenide and indium-phosphide are common semiconductor materials used in radio frequency applications.

GaN devices have better frequency characteristics than other high-frequency technologies such as indium phosphide and gallium arsenide. GaN devices must have a higher instantaneous bandwith. This can be achieved by using carrier aggregation, preparing higher frequency carriers and utilizing carrier aggregation.

Gallium nitride can achieve higher power density than silicon or any other device. GaN has a higher power density. GaN's small size is an advantage when it comes to a power level. Smaller devices can reduce device capacitance, making it easier to design higher bandwidth systems. Power Amplifiers (PA) are a critical component of the RF Circuit.


Currently, power amplifiers are primarily comprised of a gallium-arsenide power amplifier and a complementary metallic oxide semiconductor power amplifier (CMOS PA), where GaAs is the dominant technology. However, with 5G coming, it will be impossible to maintain high integration for GaAs at such high frequencies.

GaN will be the next hot topic. GaN, as a wide-bandgap semiconductor, can withstand greater operating voltages. This results in higher power densities and higher temperatures, leading to high power density.

Qualcomm President Cristiano Amon said at the Qualcomm 5G/4G Summit that the first 5G smartphones will be available in the second half of 2019, and by the end Christmas and New Year. According to reports 5G is expected to be up to 100 times more efficient than 4G networks. It will reach Gigabits per second and reduce latency.


As well as the increase in the number and density of base-stations, there will be a significant increase in RF devices. As a result, the number of RF devices required in the 5G period will increase by dozens or even hundreds of times compared to 3G and the 4G periods. Therefore, cost control and silicon-based GaN have a major cost advantage. It is possible to achieve a market breakthrough using silicon-based GaN technologies.

Commercialization of any new semiconductor technology is difficult, and this can be seen in the evolution of the last two generations. GaN, which is also in this stage at the moment, will cost more to civilians because of the increased demand for silicon-based devices, the mass production and process innovations, etc.

( Tech Co., Ltd. ) is an experienced manufacturer of Gallium Nitride with over 12 year experience in research and product development. You can contact us to send an inquiry if you want high-quality Gallium Nitride.

Inquiry us

High Purity Molybdenum Boride MoB2 Powder CAS 12006-99-4, 99%

Metal Alloy 8.92g/Cm3 High Purity Polished Copper Plate

Metal Alloy High Density Tungsten Alloy Rod Grind Surface Tungsten Alloy Bar

Metal Alloy 18g/cm3 High Density Tungsten Alloy Ball

Metal Alloy 18.5g/cm3 Polished Tungsten Heavy Alloy Plate

High Purity Antimony Sulfide Sb2S3 Powder CAS 1314-87-0, 99.99%

High Purity Germanium Sulfide GeS2 Powder CAS 12025-34-2, 99.99%

High Purity Chromium Diboride CrB2 Powder CAS 12007-16-8, 99%

High Purity Tungsten Silicide WSi2 Powder CAS 12039-88-2, 99%

High Purity Titanium Sulfide TiS2 Powder CAS 2039-13-3, 99.99%

High Purity Nano Hafnium Hf powder CAS 7440-58-6, 99%

High Purity Nano Ag Silver powder cas 7440-22-4, 99%

High Purity 3D Printing Powder 15-5 Stainless Steel Powder

Supply Magnesium Granules Mg Granules 99.95%

High Purity Silicon Sulfide SiS2 Powder CAS 13759-10-9, 99.99%

High Purity Colloidal Silver Nano Silver Solution CAS 7440-22-4

High Purity Zirconium Nitride ZrN Powder CAS 25658-42-8, 99.5%

High Purity Magnesium Diboride MgB2 Powder CAS 12007-25-9, 99%

High Purity 3D Printing 304 Stainless Steel Powder

High Purity Calcium Nitride Ca3N2 Powder CAS 12013-82-0, 99.5%

Our Latest Products

High Purity Molybdenum Boride MoB2 Powder CAS 12006-99-4, 99%

Molybdenum powder is made of a combination of molybdenum with boron. The chemical formula for molybdenum is MoB2, and the molecular weight is 202.69. Purity: >99%Particle size: 5- 10um Molybdenum Boride MoB2 Pulp : Molybdenum-boride, is a molybdenu…

Metal Alloy 8.92g/Cm3 High Purity Polished Copper Plate

Copper products exhibit good electrical conductivity as well as thermal conductivity. They are also ductile, resistant to corrosion, and have a high wear resistance. They are widely used by the electricity, electronics and energy industries. Metal…

Metal Alloy High Density Tungsten Alloy Rod Grind Surface Tungsten Alloy Bar

Tungsten-nickel-copper/iron alloy is characterized by low thermal expansion, high density, radiation absorption and high thermal and electrical conductivity. It is widely utilized in the aerospace and medical industries. About High Density Tungsten…